Chemical vapor deposition also is a promising approach for scalable synthesis of 2D materials – but automated commercial systems can be cost prohibitive for some research groups and startup companies.

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

Graphene samples with areas of several square centimetres and excellent electrical and optical properties have been fabricated using chemical vapour deposition. The three approaches are similar to ...