To better understand this solution, let’s first take a closer look at the patterning process and current photoresists, then discuss the potential advantages of the new solution. It can take several ...

The printability of any given mask feature depends on the distribution of photoresist components and EUV photons in its immediate vicinity. Chemically amplified resists Three key parameters for ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

By using colored photoresists and an i-line stepper, researchers have streamlined the production process, enhancing both ...

Global chipmakers push toward ever-smaller process nodes to pack more functionality onto each wafer. EUV photoresists are central to this trend, delivering fine resolution and high contrast ...